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Today’s semiconductor industry drives the electronics business. Recently cyclical, knowledgeable observers expect the semiconductor growth to continue with increased demand from the entire electronics value chain: computers and peripheral devices, consumer electronics, telecommunications, industrial electronics, defense, space and transportation. The industry remains volatile and must adapt at a rapid pace.

 

Download our Solution Brief for Flow, moisture, and oxygen measurement in semiconductor manufacturing

In our new solution brief, we outline everything you need to know when considering the best way to apply flow meters and analyzers in your ultra-pure environment. we also explain how two companies count on our moisture and oxygen measurement systems to solve the challenges of working in a complex environment.


Panametrics Solutions for Semiconductor

Flow Measurement
Oxygen and Moisture measurement

Flow Measurement

The semiconductor industry works with a high degree of water purity to be utilized in high-grade clean rooms, as well as high-purity gases and other chemicals for cleaning, etching, plating and planarization processes. Flow measurements within these high-purity processes must be maintained while delivering valuable outputs to run the process at its highest efficiency and availability for 24/7 operations.

Panametrics clamp-on ultrasonics flow meters are installed in semiconductor plants for:

  • Raw water, cooling water, chiller water, washing water, demineralized water, deionized water, wastewater from 15mm to 600mm (1/2” to 24”)
  • Chemicals
  • Utility gases: air, nitrogen, oxygen, argon, carbon dioxide from 15mm to 300mm (1/2” to 12”)

Oxygen and Moisture measurement

The semiconductor process requires high purity gases and other chemicals for the cleaning, purging, etching, plating and planarization processes. Any moisture and oxygen contaminants in these gases, even at the parts-per-billion (ppb) level, can be detrimental to the process yield and to product quality. Reliable and repeatable measurement and control of these contaminants is critical.



On Demand Webinar: Semiconductor – Ultraclean Industrial Environment

On this webinar we show how Panametrics can support Semicon operators with the necessary measurement to achieve the highest purity goal



Flow Meter on Semicon plant

Research has proven that precise control of the oxygen content and reliable, contamination free flow measurement on ultrapure water, utility water and gas, as well as raw water and wastewater are required for chips and other electronics components manufactured in clean rooms down to class 1.

The process of water purification moves through a number of stages. While electromagnetic flowmeters can measure the amount and quality of raw water, once the water is demineralized and deionized, conductivity becomes too low. Chemical compounds on smaller lines with have lower flows. Although the precise details and quantities are not measurable, these compounds can include acetone, trichloroethylene and isopropyl alcohol, among others, most of which could cause safety hazards and therefore must be leak-free.

semicon drawing

All gases feed industrial manufacturing plants with nitrogen, oxygen, argon, hydrogen, helium, carbon dioxide and air to enable manufacturing. Nitrogen, oxygen, argon, hydrogen and helium typically are typically employed as purge gases in the semiconductor fabrication process. These gases must be of the highest purity as even parts-per-billion (ppb) levels of contaminants, such as moisture and oxygen, can negatively impact process yield and product quality.

Chemical Supply in Semicon
Solutions

Panametrics clamp-on ultrasonics flow meters are installed in semiconductor plants for:

  • Raw water, cooling water, chiller water, washing water, demineralized water, deionized water, wastewater from 15mm to 600mm (1/2” to 24”)
  • Chemicals
  • Utility gases: air, nitrogen, oxygen, argon, carbon dioxide from 15mm to 300mm (1/2” to 12”)

The main drivers towards this clamp-on technology are:

  • Installation within minutes from outside the pipe
  • No interruption of process 
  • No risk of contamination
  • No drift over time 
  • Smart meters with embedded diagnostics to assess their ‘health’
  • Improves energy efficiency as meters do not generate pressure drop
  • Low CAPEX and OPEX
  • Increases process availability with no downtime
  • High reliability

 

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